ION IMPLANTATION AND ANALYSIS

Services Available

1.) DYNAMITRON ACCELERATOR
- Energy 0.3 - 4.2 MeV.
This can include : Size to 8 inch diameter.
- ION IMPLANTATION
- H, D, 3He, 4He, 10B, 11B, 12C, 14N, 15N, 16O, F, Ne, P, Cl, Ar, Kr, Xe
- ANALYSIS
- RBS, PIXE, NRA & Microbeam facility with resolution to 1 micron.
- Composition, thickness and profile of concentration vs depth for many
- materials.

2.) 1-3 MeV TANDEM IMPLANTER
- ION IMPLANTATION
- - H, Li, 10B, 11B, 12C, 16O, F, Si, P, Cr, Fe, Ni, Cu, Zn, Ga, Ge, Se, Ag, In,
- - 118Sn, 120Sn, Te, Pt, Au and many other ions.
- - 4 inch wafers standard, smaller wafers as needed.

3.) 50-400 keV EXTRION IMPLANTER
- ION IMPLANTATION
- - Very wide range of ions available, including H, D, He, Li, Be, B, C, N, 16O,
- - 18O, F, Si, Cl, Ar, Ca, 63Cu, 65Cu, Zn, Ge, As, Se, Kr, Zr, Pd, Ag, Xe, Cs,
- - Ce, Pb
- - Size to 8 inch diameter.

4.) 10-150 keV DANFYSIK IMPLANTER
- ION IMPLANTATION
- - Very wide range of ions available.