- Using Nuclear Reaction Analysis.
- Determined using resonant nuclear reaction.
- Intrinsically capable of determining the Hydrogen content of any material without use of reference
standard samples.
- Hydrogen profiling up to ~1.2 micro meters.
- Depth resolution ~100A.
- Sensitivity ~100ppm (atomic).
Applications in SiO2:H thin films.
Applications in the analysis of Hydrogen content in Semiconductors, Metals and Superconductors.
- Using Nuclear Reaction Analysis.
- Determined using resonant nuclear reaction.
- Intrinsically capable of determining the Fluorine content of any material without use of reference
standard samples.
- Fluorine profiling up to ~1.5 micro meters.
- Depth resolution ~250A.
- Sensitivity ~100ppm (atomic).
Applications in SiO2:F thin films.
Applications in the analysis of Fluorine content in Semiconductors, Metals and Superconductors.