HYDROGEN PROFILING


Hydrogen concentration Vs depth :

- Using Nuclear Reaction Analysis.

- Determined using resonant nuclear reaction.

- Intrinsically capable of determining the Hydrogen content of any material without use of reference

standard samples.

- Hydrogen profiling up to ~1.2 micro meters.

- Depth resolution ~100A.

- Sensitivity ~100ppm (atomic).

Applications in SiO2:H thin films.

Applications in the analysis of Hydrogen content in Semiconductors, Metals and Superconductors.

FLUORINE PROFILING


Fluorine concentration Vs depth :

- Using Nuclear Reaction Analysis.

- Determined using resonant nuclear reaction.

- Intrinsically capable of determining the Fluorine content of any material without use of reference

standard samples.

- Fluorine profiling up to ~1.5 micro meters.

- Depth resolution ~250A.

- Sensitivity ~100ppm (atomic).

Applications in SiO2:F thin films.

Applications in the analysis of Fluorine content in Semiconductors, Metals and Superconductors.